Study the Influence of Thermal Oxidation on the Structures of Titanium Very Thin Layers
نویسنده
چکیده
Ti films with the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Different annealing temperatures 120, 270 and 320 degree Celsius with 7 cm/sec uniform oxygen flow, were used for producing titanium oxide layers. Thin film structures were studied by AFM and XRD methods. During annealing processes roughness of the films changed due to the formation of titanium oxide. Titanium oxide formation at various annealing temperature can play an important role on the structure and property of the films.
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تاریخ انتشار 2011